Trimethyl Phosphite (TMP)
High-purity phosphorus precursor for PSG and BPSG layer formation.
Enables controlled doping and dielectric deposition in advanced semiconductor manufacturing.
Phosphorus-Rich Precursor for Uniform Glass Layer Deposition
Trimethyl Phosphite (TMP) is a high-purity phosphorus source used in the formation of phospho-silicate glass (PSG) and boro-phospho-silicate glass (BPSG) layers. These layers are deposited during wafer fabrication to serve as dielectric insulators and stress-relief layers in semiconductor devices.
With excellent volatility and controlled decomposition behavior, TMP is well-suited for chemical vapor deposition (CVD) and related processes, supporting uniform phosphorus incorporation in integrated circuits, discrete devices, and MEMS components.
NAGASE supplies Trimethyl Phosphite in electronic-grade quality for global semiconductor and microelectronics manufacturing – supported by expert logistics and technical service.
Chemical Formula: P(OCH3)3
Molecular Weight: 124.08
Physical & Chemical Properties
A colorless liquid with pungent odor.
Melting Point: -78 ℃
Boiling Point: 111 to 112 ℃
Density: 1.05 g/mL
Flammable. Insoluble in water. Slowly hydrolyzed into Phosphoric Acid and Methanol when it contacts with water.
Applications
Trimethyl Phosphite is mainly used for PSG and BPSG deposition in semiconductor wafer processing.
- Deposition of PSG and BPSG dielectric layers
- Wafer fabrication for IC and chip production
- Semiconductor manufacturing involving phosphorus doping
- Production of MEMS and microcomponents
- Processing of discrete devices
Features
Trimethyl Phosphite provides high phosphorus content, reliable volatility, and compatibility with vapor-phase deposition methods for dielectric applications.
- High-purity phosphorus precursor – Suitable for PSG and BPSG formation
- Low metal impurities to meet semiconductor-grade standards
- Consistent volatility – Ideal for controlled deposition conditions
- CVD-process compatibility – Enables uniform phosphorus distribution
- Globally available – Supplied by NAGASE with full technical support
Product Specification
| Product | 8.5N | ||
|---|---|---|---|
| Purity (based on metals analyzed), min | 99.9999995% | ||
| （Al）max | 0.7 ppb | （Pt）max | 0.05 ppb |
| （Sb）max | 0.05 ppb | （K）max | 0.3 ppb |
| （As）max | 0.5 ppb | （Re）max | 0.05 ppb |
| （Ba）max | 0.05 ppb | （Rh）max | 0.05 ppb |
| （Be）max | 0.1 ppb | （Rb）max | 0.05 ppb |
| （Bi）max | 0.05 ppb | （Ag）max | 0.3 ppb |
| （Cd）max | 0.1ppb | （Na) max | 1 ppb |
| （Ca）max | 1 ppb | （Sr）max | 0.05 ppb |
| （Ce）max | 0.05 ppb | （Ta）max | 0.05 ppb |
| （Cr）max | 0.1 ppb | （Tl）max | 0.05 ppb |
| （Co）max | 0.1 ppb | （Th）max | 0.1 ppb |
| （Cu）max | 0.5 ppb | （Sn）max | 0.5 ppb |
| （Ga）max | 0.05ppb | （Ti）max | 0.3 ppb |
| （Ge）max | 0.05 ppb | （W ）max | 0.05 ppb |
| （Au）max | 0.1 ppb | （U ）max | 0.1 ppb |
| （Hf）max | 0.2 ppb | （V ）max | 0.05 ppb |
| （In）max | 0.05 ppb | （Zn）max | 0.5 ppb |
| （Ir）max | 0.05 ppb | （Zr）max | 0.1 ppb |
| （Fe）max | 0.5 ppb | （B ）max | 50 ppb |
| （Pb）max | 0.5 ppb | Cl-max | 50 ppb |
| （Li）max | 0.1 ppb | Water max | 25 ppm |
| （Mg）max | 0.2 ppb | Particles ≥0.µm max | 10 p/ml |
| （Mn）max | 0.1 ppb | Particles ≥0.3 µm max | 7 p/ml |
| （Hg）max | 0.2 ppb | Particles ≥0.5 µm max | 5 p/ml |
| （Mo）max | 0.1 ppb | Particles ≥1.0 µm max | 1 p/ml |
| （Ni）max | 0.5 ppb | Chroma max | 5APHA |
| （Nb）max | 0.05 ppb | Assay min | 99.99 % |
| （Pd）max | 0.05 ppb | Shelf life | 12 months |
Packaging Size
Container: Stainless Steel Cylinder
Packaging: Stainless Steel Cabinet
Fill volume: 2 gallons, 5 gallons (19 L),10 gallons.
