Trimethyl Phosphate (TMPO)

High-purity phosphorus ester for PSG and BPSG deposition.
Enables precise dielectric layering in wafer fabrication and microelectronics production.

Consistent Phosphorus Doping for Dielectric Glass in Microelectronics

Trimethyl Phosphate (TMPO) is a high-purity phosphorus ester widely used as a dopant precursor in the formation of phospho-silicate glass (PSG) and boro-phospho-silicate glass (BPSG) dielectric layers. These layers are applied during wafer fabrication through chemical vapor deposition (CVD) to enhance isolation, planarization, and stress control in semiconductor devices.

With excellent volatility and thermal behavior, TMPO is suitable for both front-end and back-end semiconductor processes, including the production of integrated circuits, MEMS, and discrete components.

NAGASE supplies electronic-grade TMPO globally to support advanced semiconductor manufacturing, providing both logistics and technical expertise.

Molecular formula: PO(OCH3)3

Relative molecular mass: 140.08

Chemical & Physical Properties:

Colorless liquid, fruit flavor,

Melting point: -46 C

Boiling point: 197 °C

Density :1.20 g / ml.

Flammable, soluble in water and ether, insoluble in ethanol.

Applications

Trimethyl Phosphate is mainly used for PSG and BPSG deposition in semiconductor wafer processing.

  • Deposition of PSG and BPSG layers
  • Wafer fabrication workflows in IC and chip production
  • Semiconductor manufacturing for doped dielectric films
  • Processing of discrete components
  • Fabrication of MEMS devices and microstructures

Features

Trimethyl Phosphate offers high purity, consistent thermal behavior, and excellent compatibility with CVD processes in advanced microelectronics manufacturing.

  • Electronic-grade formulation – Suitable for critical PSG and BPSG applications
  • Low metal impurities to ensure clean dielectric deposition
  • Excellent volatility – Supports uniform vapor-phase delivery
  • Thermal stability for reliable behavior in high-temperature processes
  • Global availability – Supplied by NAGASE with full technical support

Product Specification

Analysis Project

Technical indicators

Purity, min

99.9999995%(8.5N)

Chloride, max

50 ppb

Moisture, max

 20  ppm

Number of particles ≥ 0.3 µm,max

7  p/ml

Number of particles ≥ 0.5 µm,max

5  p/ml

Main content, min

99.99%

Chroma, max

5APHA

Packaging Size

Container: Stainless steel bottle

Packing: Stainless steel locker

Specification: 5 gallons (19 L)

Frequently Asked Questions about Trimethyl Phosphate (TMPO)

What is Trimethyl Phosphate (TMPO) used for in semiconductor manufacturing?
TMPO is mainly used as a phosphorus precursor for PSG and BPSG dielectric layer deposition during wafer fabrication.

Why is TMPO important in dielectric glass formation?
It enables precise phosphorus incorporation into glass films, improving dielectric performance, flow behavior, and planarity in semiconductor structures.

Is TMPO suitable for CVD processes?
Yes, TMPO is commonly used in chemical vapor deposition due to its excellent volatility and clean decomposition properties.

Can TMPO be used in MEMS and discrete device production?
Absolutely. TMPO is used in MEMS and discrete semiconductor components where doped dielectric layers are required.

What makes electronic-grade TMPO suitable for critical applications?
Its low impurity levels and consistent thermal performance make it ideal for high-precision microelectronics manufacturing.

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Electronics

Enes Islemecioglu
Sales Manager