Phosphorus Oxychloride for Semiconductor and Synthesis Applications
Reliable reactivity for high-tech manufacturing.
Nagase offers POCl₃ in electronic and industrial grades for diffusion doping, phosphorylation reactions, and advanced chemical processes.
High-Purity POCl₃ for Critical Chemical Processes
Phosphorus oxychloride (POCl₃) is a highly reactive phosphorus compound used in semiconductor manufacturing, flame retardant synthesis, and organic chemical production. In electronics, it serves as a key source of phosphorus for diffusion doping in silicon wafers and is commonly applied via chemical vapor deposition (CVD). Its high purity and controlled reactivity make it ideal for precise phosphorylation reactions and other advanced industrial processes.
As a trusted global supplier, NAGASE provides phosphorus oxychloride with reliable quality, safe handling solutions, and compliance with stringent purity specifications for electronics and chemical manufacturing.
Chemical Formula: POCl3
Molecular Weight: 153.33
Physical & Chemical Properties
A colorless, clear and volatile liquid with strong pungent odor. Hydrolyzed in humid air to make phosphoric acid and hydrochloric acid.
Melting Point: 1.25 ℃
Boiling Point: 105.1 ℃
Density: 1.675 kg/L
Heat of Vaporization: 33.7 kJ/mol
Chemically stable below 300℃. Explodes when it contacts with large quantities of water. Toxic and corrosive.
Applications
Phosphorus oxychloride (POCl₃) is used across the electronics industry as a key phosphorus source for doping, wafer processing, and high-purity intermediate production.
- N-type diffusion doping in wafer fabrication processes
- Liquid phosphorus source for ICs, solar cells, and optical fiber preforms
- Discrete device manufacturing in high-performance electronics
- Essential wafer processing material in semiconductor production
- Raw material for phosphate esters used in specialty chemical synthesis
Features
Phosphorus oxychloride (POCl₃) is engineered for electronic-grade performance and consistent quality in advanced manufacturing.
- High chemical purity and excellent batch-to-batch consistency
- Suitable for electronic-grade applications in semiconductor and optical industries
- Reliable phosphorus source for diffusion doping and phosphorylation processes
- Available in multiple container types and purity grades to meet specific requirements
- Backed by global logistics and regulatory expertise for safe and compliant supply
Product Specification
| Product | 6N | 7N | Product | 6N | 7N |
|---|---|---|---|---|---|
| Al, max | 40 ppb | 5 ppb | Li, max | 10 ppb | 6 ppb |
| As, max | 30 ppb | 6 ppb | Mg, max | 20 ppb | 5 ppb |
| Ag, max | 1 ppb | 1 ppb | Mn, max | 30 ppb | 1 ppb |
| Au, max | 1 ppb | 1 ppb | Na, max | 10 ppb | 5 ppb |
| Ba, max | 20 ppb | 1 ppb | Nb, max | 2 ppb | 1 ppb |
| Bi, max | 10 ppb | 1 ppb | Ni, max | 20 ppb | 1 ppb |
| Ca, max | 30 ppb | 5 ppb | Pb, max | 10 ppb | 3 ppb |
| Co, max | 20 ppb | 1 ppb | Sn, max | 5 ppb | 1 ppb |
| Cu, max | 20 ppb | 2 ppb | Sr, max | 5 ppb | 1 ppb |
| Cr, max | 20 ppb | 1 ppb | Ti, max | 5 ppb | 2 ppb |
| Fe, max | 40 ppb | 5 ppb | Zn, max | 5 ppb | 1 ppb |
| Ga, max | 1 ppb | 1 ppb | Assay, max | 99.9% | 99.9% |
| Hg, max | 10 ppb | 5 ppb | Chroma, max | 5 APHA | 5 APHA |
| K, max | 30 ppb | 3 ppb | Particles/ml ≥0.3μm | 50 | 50 |
Packaging Size
Container: High purity quartz bubbler. Coated high purity quartz bubbler.
Packaging: PVC plastic bag + Polyfoam + Drum.
Fill volume: 500 ml, 1000 ml, 1500 ml,4.2L,5L or Customized.
