Boron Tribromide for High-Purity Applications
Reliable performance for sensitive chemical processes.
Nagase supplies high-purity boron tribromide (BBr₃) for advanced synthesis, demethylation, and semiconductor applications.
High-Performance BBr₃ for Synthesis and Semiconductors
Boron tribromide (BBr₃) is a highly reactive compound used in organic synthesis and semiconductor manufacturing. It plays a key role in the demethylation of ethers and serves as an essential reagent in chemical vapor deposition (CVD) processes. With its strong Lewis acidity and high purity, BBr₃ enables precise doping and etching steps in advanced materials production. Its performance and reactivity make it indispensable in both R&D and industrial-scale applications.
As a global supplier of electronic-grade reagents, NAGASE offers boron tribromide in high-purity grades with reliable availability for critical process environments.
Applications
Electronic-grade boron tribromide (BBr₃) is widely used in semiconductor manufacturing, fine chemical production, and organic synthesis where high purity and strong Lewis acidity are essential.
- Semiconductor doping and etching – P-type diffusion doping in IC, solar cell, and discrete device manufacturing
- Organic synthesis – Demethylation of aromatic ethers and complex transformations
- Bromination reactions – Used in fine chemical and pharmaceutical intermediates
- Raw material for high-purity boron and organoboron compound production
- Catalyst systems and other specialty chemistry applications
Features
Boron tribromide (BBr₃) offers high reactivity, excellent purity, and precise control for demanding chemical and semiconductor processes.
- Powerful Lewis acid – Enables efficient ether cleavage and bromination reactions
- Ultra-high purity grades – Suitable for semiconductor and electronic materials manufacturing
- High volatility – Ideal for gas-phase applications such as chemical vapor deposition (CVD)
- Stable supply and quality control – Ensures consistency in industrial and R&D environments
- Versatile reactivity – Applicable across organic synthesis, catalysis, and specialty chemistry
Product Specification
| Product | 6N | 7N | Product | 6N | 7N |
|---|---|---|---|---|---|
| Al, max | 15 ppb | 5 ppb | Li, max | 2 ppb | 1 ppb |
| As, max | 4 ppb | 1 ppb | Mg, max | 20 ppb | 8 ppb |
| Ca, max | 10 ppb | 5 ppb | Mn, max | 2 ppb | 1 ppb |
| Ba, max | 2 ppb | 1 ppb | Hg, max | 12 ppb | 1 ppb |
| Bi, max | 2 ppb | 1 ppb | Ni, max | 2 ppb | 1 ppb |
| Cr, max | 2 ppb | 1 ppb | K, max | 10 ppb | 3 ppb |
| Co, max | 2 ppb | 1 ppb | Ag, max | 2 ppb | 1 ppb |
| Cu, max | 5 ppb | 2 ppb | Na, max | 10 ppb | 5 ppb |
| Ga, max | 2 ppb | 1 ppb | Sr, max | 2 ppb | 1 ppb |
| Au, max | 2 ppb | 1 ppb | Sn, max | 2 ppb | 1 ppb |
| Fe, max | 20 ppb | 10 ppb | Ti, max | 2 ppb | 1 ppb |
| Pb, max | 2 ppb | 1 ppb | Zn, max | 5 ppb | 3 ppb |
| Cd, max | 2 ppb | 1 ppb | Chroma, max | 60 APHA | 60 APHA |
Packaging Size
Container: Coated high purity quartz bubbler.
Packaging: PVC plastic bag + Polyfoam + Drum.
Fill volume: 500 ml, 950 ml, 1150 ml and/or Customized.
Frequently Asked Questions about Boron Tribromide
What is boron tribromide used for?
Boron tribromide (BBr₃) is used in organic synthesis for demethylation reactions and in semiconductor manufacturing for doping and etching processes, particularly in chemical vapor deposition (CVD) systems.
How is BBr₃ applied in the semiconductor industry?
It serves as a source for P-type diffusion doping during the production of integrated circuits (ICs), solar cells, and discrete devices.
Why is high purity important for boron tribromide?
In electronic applications, even trace impurities can affect performance—high-purity BBr₃ ensures reliable, consistent results in sensitive processes.
Is boron tribromide used in catalyst systems?
Yes, BBr₃ is also used in various catalytic and specialty chemical reactions due to its strong Lewis acidity and versatility.
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