High Resolution Dry Film Photoresist Negative Tone
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Photoresists are light-sensitive materials used to form patterned coatings on various materials. We offer four series of negative image dry film photoresists for laminating applications.
Applications
- Semiconductor
- MEMS
Additional Information
DF-1000 Series for consistent photospeed and +/- 3% critical dimension target
- Clear, excellent tenting characteristics
- Hydrophobic
- Available in various thicknesses (5-50 um)
DF-2000 Series for improved hydrophobicity
- Green tint
- Excellent tenting characteristics
- Hydrophobic
- Available in various thicknesses (5-25 um)
DF-3000 Series for improved hydrophobicity
- Antimony-free
- Clear, excellent tenting characteristics
- Hydrophobic
- Available in various thicknesses (5-25um)
DF-4000 Series
- Extremely hydrophobic (90º H2O contact angle)
Electronics
Yenn Leng Tan
Sales Manager